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dc.contributor.authorTian, Y.F.
dc.contributor.authorYan, Shi-Shen
dc.contributor.authorZhang, Y.P.
dc.contributor.authorSong, H.Q.
dc.contributor.authorJi, G.
dc.contributor.authorLiu, G.L.
dc.contributor.authorMei, M.L.
dc.contributor.authorLiu, J. Ping
dc.contributor.authorAltuncevahir, B.
dc.contributor.authorChakka, V.
dc.contributor.authorChen, Y.X.
dc.date.accessioned2010-08-16T19:47:26Z
dc.date.available2010-08-16T19:47:26Z
dc.date.issued2006-11-16
dc.identifier.citationJ. Appl. Phys. 100, 103901 (2006)en_US
dc.identifier.issn0021-8979 (print)
dc.identifier.urihttp://hdl.handle.net/10106/5017
dc.description.abstractTransformation of the electrical transport from the Efros and Shklovskii [J. Phys. C 8, L49 (1975)] variable range hopping to the “hard gap” resistance was experimentally observed in a low temperature range as the Fe compositions in Zn1−xFexO1−v ferromagnetic semiconductor films increase. A universal form of the resistance versus temperature, i.e., ρ∝exp[TH/T+(TES/T)1/2], was theoretically established to describe the experimental transport phenomena by taking into account the electron-electron Coulomb interaction, spin-spin exchange interaction, and hard gap energy. The spin polarization ratio, hard gap energy, and ratio of exchange interaction to Coulomb interaction were obtained by fitting the theoretical model to the experimental results. Moreover, the experimental magnetoresistance was also explained by the electrical transport model.en_US
dc.language.isoen_USen_US
dc.publisherAmerican Institute of Physicsen_US
dc.subjectZinc compoundsen_US
dc.subjectMagnetic semiconductorsen_US
dc.subjectSemiconductor thin filmsen_US
dc.subjectMagnetic thin filmsen_US
dc.subjectHopping conductionen_US
dc.subjectEnergy gapen_US
dc.subjectFerromagnetic materialsen_US
dc.subjectSpin-spin interactionsen_US
dc.subjectElectron spin polarisationen_US
dc.subjectExchange interactions (electron)en_US
dc.subjectMagnetoresistanceen_US
dc.titleTransformation of electrical transport from variable range hopping to hard gap resistance in Zn[subscript]1−[subscript]xFe[subscript]xO[subscript]1[subscript]v magnetic semiconductor filmsen_US
dc.typeArticleen_US
dc.publisher.departmentDepartment of Physics, The University of Texas at Arlingtonen_US
dc.identifier.externalLinkhttp://link.aip.org/link/JAPIAU/v100/i10/p103901/s1en_US
dc.identifier.externalLinkDescriptionThe original publication is available at journal homepageen_US


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