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dc.contributor.authorVandrevala, Farah P.en_US
dc.date.accessioned2013-07-22T20:14:31Z
dc.date.available2013-07-22T20:14:31Z
dc.date.issued2013-07-22
dc.date.submittedJanuary 2013en_US
dc.identifier.otherDISS-12177en_US
dc.identifier.urihttp://hdl.handle.net/10106/11860
dc.description.abstractThe Insulated Gate Bipolar Transistor (IGBT) is a power semiconductor device widely used in high-speed switching applications. Due to aging and internal heating, the device is prone to a failure mechanism known as latch-up in which, changes in the threshold voltage and the on-state voltage of the device may ultimately lead to loss of switching control.Since IGBTs are typically operated at high voltages and currents, the datasheets do not provide information on the static characteristics of the device for voltages close to the threshold, which is a useful region for understanding the underlying device physics.In this thesis a simplified IGBT model is presented that attempts to provide a magnified view of the static characteristics close to the threshold voltage. The model is developed based on the device structure and is optimized to fit the measured characteristics in the near-threshold voltage range.en_US
dc.description.sponsorshipCarter, Ronald L.en_US
dc.language.isoenen_US
dc.publisherElectrical Engineeringen_US
dc.titleModeling And Characterization Of The Insulated Gate Bipolar Transistor In The Near-threshold Regionen_US
dc.typeM.S.en_US
dc.contributor.committeeChairCarter, Ronald L.en_US
dc.degree.departmentElectrical Engineeringen_US
dc.degree.disciplineElectrical Engineeringen_US
dc.degree.grantorUniversity of Texas at Arlingtonen_US
dc.degree.levelmastersen_US
dc.degree.nameM.S.en_US


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